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ArF Photoresist

Introduction

ArF Photoresist is a key material in lithography process. Pattern on photomask can be transferred to substate by its photosensitive property.

Description

Use:

Lithography process.

Spec:

  • Unit : Gallon
  • The material is brown glass bottle, other manufacturers use NOWpak packaging.
  • Keep refrigerated
  • Bonded goods

Product Contact

Terry Wang

Sales Dept. I, Advanced Material Div. II, 1st Business Unit
Senior Manager

TOPCO SCIENTIFIC CO.,LTD.

No. 483, Sec. 2, Tiding Blvd., Neihu Dist., Taipei City 114511, Taiwan
TEL: (02)8797-8020 ext.2746
e-mail: terry.wang@topco-global.com

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