- Unit : Gallon
- The material is brown glass bottle, other manufacturers use NOWpak packaging.
- Keep refrigerated
- Bonded goods
ArF Photoresist is a key material in lithography process. Pattern on photomask can be transferred to substate by its photosensitive property.
No. 483, Sec. 2, Tiding Blvd., Neihu Dist., Taipei City 114511, Taiwan
TEL: (02)8797-8020 ext.2746