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ArF Photoresist

Introduction

ArF Photoresist is a key material in lithography process. Pattern on photomask can be transferred to substate by its photosensitive property.

Description

Details:

ArF Photoresist is a key material in lithography process. Pattern on photomask can be transferred to substate by its photosensitive property.

Use:

Lithography process

Spec:

Unit:Gallon
The material is brown glass bottle,
Other manufacturers use NowPac packaging
Store at room temperature
Bonded goods