Integrative
Capabilities
Quality
Advanced
Production
Execution

ArF Photoresist

Introduction

ArF Photoresist is a key material in lithography process. Pattern on photomask can be transferred to substate by its photosensitive property.

Description

Details:

ArF Photoresist is a key material in lithography process. Pattern on photomask can be transferred to substate by its photosensitive property.

Use:

Lithography process

Spec:

Unit:Gallon
The material is brown glass bottle,
Other manufacturers use NowPac packaging
Store at room temperature
Bonded goods

提醒

本網站不支援您所使用的瀏覽器

為了提供您最佳的網站體驗,
請您改用下列幾種瀏覽器瀏覽本網站,謝謝您的合作。