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AP Plasma clean

Introduction

Atmospheric pressure plasma surface treatment device is to replace conventional UV Lamp mode,a high-performance modification effect and help reduce operating costs. For the treatment of the substrate to suppress the induction voltage may be zero volts to the approximation,therefore, does not affect the transistor characteristics.
In addition to handling performance advantage and Running Cost regard, it is desirable UV Lamp Process. Another way to replace the process gas can be splashing, and do not leave water marks after drying at room temperature precision dry, but also cell processing, sterilization, sterilization. This can be considered to replace a part of the vacuum Plasma, and may be the lowest cost method of continuous treatment.

Description

Use:

  1. Initial Clean
  2. Before precision washing
  3. Before Photo Resist Coating
  4. Before ITO Sputtering
  5. Before Wet Etching
  6. Before PI Coating
  7. Before Overcoating
  8. Precision drying after washing
  9. Others

Spec:

Customized

Product Contacts

Yu Ching Yang

Sales Dept.Ⅱ, Mechanical Equipment Div., 3rd Business Unit
Project Assistant Manage

TOPCO SCIENTIFIC CO.,LTD.

1F., No. 8, Chuangye Rd., Science Based Industrial Park, Sinshih District, Tainan City 744094, Taiwan
TEL: (06)505-8940 ext.6181
e-mail: yu.ching.yang@topco-global.com