Atmospheric pressure plasma surface treatment device is to replace conventional UV Lamp mode,a high-performance modification effect and help reduce operating costs. For the treatment of the substrate to suppress the induction voltage may be zero volts to the approximation,therefore, does not affect the transistor characteristics.
In addition to handling performance advantage and Running Cost regard, it is desirable UV Lamp Process. Another way to replace the process gas can be splashing, and do not leave water marks after drying at room temperature precision dry, but also cell processing, sterilization, sterilization. This can be considered to replace a part of the vacuum Plasma, and may be the lowest cost method of continuous treatment.