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IC Pellicle

Introduction

Pellicle is used in IC manufacture process, as a protection of photomasks against dust.

Description

Use:

  • To protect photomask against dust.
  • Prevent the invasion of foreign objects.
  • Maintain light reaction chemically stability.

Spec:

  • Unit: piece
  • Transmission rate: above 99%
  • For 6″” photomask (KrF/ArF application)

Product Expert

Nina Chen

Advanced Material Div. I, 1st Business Unit
Project Manager

崇越科技股份有限公司

No.483, Sec. 2, Tiding Blvd., Neihu, Taipei City 114

TEL:(02)8797-8020 ext.2725
e-mail:nina.chen@topco-global.com