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NF3

Introduction

Nitrogen trifluoride (NF3) is the most stable of nitrogen halides and can be made from ammonia and fluorine catalyzed by calcium.  It can be used as an oxidizer in hydrogen fluoride lasers and as an etching agent in the production of semiconductors, liquid crystals and thin-film solar cells.

Description

Nitrogen trifluoride (NF3) is an excellent plasma etching gas with excellent etching rate and selectivity. It does not leave any residue on the etching surface and is a very good cleaning agent. At the same time in the chip manufacturing, in the high energy laser has been widely used.

Product Contact

Dino Wu

Sales Dept. I, High Performance Material Div., 5th Busines Unit
Senior Manager

TOPCO SCIENTIFIC CO.,LTD.

6F., No. 12, Industry E. 9th Rd., Science based Industrial park, Hsinchu City 300096, Taiwan
TEL: (03)564-2132 ext.3315
e-mail: dino.wu@topco-global.com

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