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Special Gas

Introduction

Chemours Clean Gas, C4F8, applied in T/F CVD chamber clean

Description

Use:

C4F8, replace C2F6, C3F8 in T.F chamber cleaning

Spec:

For In-Situ tool(6″ and 8″) chamber clean

Product Contacts

Dino Wu

Sales Dept. I, High Performance Material Div., 5th Busines Unit
Senior Manager

TOPCO SCIENTIFIC

4F & 6F., No.12, Gongye E. 9th Rd., East Dist., Hsinchu City 300, Taiwan
TEL:(03)564-2132 ext.3315
e-mail:dino.wu@topco-global.com