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Thick Film Photoresist (I-Line)

Introduction

Thick film photoresist, it’s designed for special MEMS & CSP application.
I-line photoresist has good absorption ability to 365nm wavelength.

Description

Details:

Thick film photoresist, it’s designed for special MEMS & CSP application.
I-line photoresist has good absorption ability to 365nm wavelength.

Use:

  1. For plating & Sputtering process.
  2. Dielectric layer, buffer layer & passivation layer for Chip Size Package application.

Spec:

Special designed for each customer.