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IC Pellicle

Introduction

Pellicle is used in IC manufacture process, as a protection of photomasks against dust.

Description

Use:

  • To protect photomask against dust.
  • Prevent the invasion of foreign objects.
  • Maintain light reaction chemically stability.

Spec:

  • Unit : piece
  • Transmission rate : above 99%
  • For 6 inch photomask (KrF/ArF application)

Product Contact

Nina Chen

Sales Dept. Ⅱ, Advanced Material Div. I, 1st Business Unit
Project Manager

TOPCO SCIENTIFIC CO.,LTD.

No. 483, Sec. 2, Tiding Blvd., Neihu Dist., Taipei City 114511, Taiwan
TEL: (02)8797-8020 ext.2725
e-mail: nina.chen@topco-global.com

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