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KrF photoresist

Introduction

DUV KrF photoresist is a key material in lithography process. Pattern on photomask can be transferred to substrate by its photosensitive property.

Description

Use:

Lithography process

Spec:

  • Unit : Gallon
  • The material is stored in a brown glass bottle, and another manufacturer uses NowPac packaging.
  • Store at room temperature
  • Bonded goods

Product Contact

Li Wei Chen

Sales Dept. Ⅱ, Advanced Material Div. II, 1st Business Unit
Senior Manager

TOPCO SCIENTIFIC CO.,LTD.

No. 483, Sec. 2, Tiding Blvd., Neihu Dist., Taipei City 114511, Taiwan
TEL: (02)8797-8020 ext.2739
e-mail: lw.chen@topco-global.com

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