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Technology and R&D overview

  1. The Group established the photoelectric thermal material laboratory in 2010 to further our capability in material research and development, focusing on the development of materials used in photoelectric, heat conductors and heat ventilators. After a decade of hard work, our research and development yield outstanding results. We successfully developed products including optical IR ink, surface finish anti-glare and anti-hardening coating and silicone material and epoxy compound for LED packaging commercial sale.
  2. We have successfully developed the surface coating materials used in fingerprint identification and the process technology, including IR absorbent optical coating (IR absorber paint) and high-strength ink coating which are being mass produced to offer our customers a total solution for the materials required for the later part of the manufacturing process of fingerprint identification modules.
  3. We will constantly assess, develop, and introduce new products, including the key materials for 5G primer materials; high-conductivity and high shock absorbency cooling potting materials; and low-warping black filler and transparent protective packaging materials.
  4. In response to the potential of the market for Mini-LED and Micro-LED applications, the Group has actively pursued the development of key materials required for the mass transfer process to assist suppliers and customers in successfully developing the application materials required for the mass transfer process.
  5. On green energy, the Company continues to keep on top of environmental protection issues and makes long-term investments in wastewater treatment technology and products that meet the latest environmental protection regulations, to help customers resolve the challenge they face with handling wastewater produced by high-tech manufacturing. We have successfully developed the wastewater treatment system for to treat wastewater produced by the photolithography process and bounding process, as well as grinding and cutting solutions, porous solid bio-carriers, and wastewater that contains fluoride. The Company has devoted several years to developing the wastewater treatment technology. Our solid research and development energy and results are widely acclaimed by our customers in Taiwan and offshore.
  6. In response to the wastewater discharge standards becoming increasingly rigorous, in the past two years, the Company has developed volatile wastewater treatment system, suspension radio treatment system, continuous Caro’s acid decomposition and recycling system, mixed fire resistant and reactive chemicals treatment system, and organic sludge dewatering system. We successfully launched our wastewater systems in local and offshore high-tech plants to assist our clients in meeting the wastewater discharge standards as well as the cost of treating wastewater.
  7. In wastewater treatment technology, during 2019, the Group successfully developed some advanced wastewater treatment technology including the IPA wastewater treatment technology (concentrate + catalytic oxidation), wasted CO2 recovery, ammoniacal nitrogen pollutant removal technology, technology to recycle valuable (copper) metal in wastewater, low derivative wastewater treatment technology to help our clients in improving the efficiency and cost of wastewater treatment. Several clients verified and chose to use the technology.
  8. In the field of waste reduction, recycle and reuse, Topco Group, in the recent years, continuously develops the phase separation technology, by which, the valuable materials are separated from wastewater or waste effluent and concentrated; and meanwhile, we help clients reduce outsourcing cleaning costs and evaluate the potential of materials for recycle and reuse.
  9. Total research and development cost for 2021 was NT 101,172 thousand dollars.
  10. Important patents of the Company are listed as follows:
    • 「WASTEWATER TREATMENT SYSTEM」was granted the utility model patent and patented as CN201770529U, CN202220106U.
    • 「PROTECTION STRUCTURE FOR WAFER CIRCUIT AND MANUFACTURING METHOD THEREOF」was granted the utility model patent and patented as TW390600.
    • 「FLEXIBLE OPTICAL FILM AND MANUFACTURING METHOD THEREOF」was granted the utility model patent and patented as CN103293574A.
    • 「TOUCH PANEL AND SHADING MATERIAL THEREOF」was granted the utility model patent and patented as TW500953, CN103725196A.
    • 「APPARATUS FOR REMOVING FLUORIDE FROM WASTEWATER」was granted the utility model patent and patented as TW502684, CN 204702589U.
    • 「APPARATUS FOR REMOVING POLLUTANTS FROM WASTEWATER」was granted the utility model patent and patented as TW502685.
    • 「APPARATUS FOR REMOVING POLLUTANTS FROM WASTEWATER」was granted the utility model patent and patented as CN204508920U.
    • 「METHOD FOR MANUFACTURING POROUS SOLID-STATE MATERIAL」was granted the utility model patent and patented as TW515244, CN 104888538A.
    • 「VOLATILE WASTEWATER TREATMENT SYSTEM」was granted the utility model patent and patented as TW535228, CN 205676189U.
    • 「CHARGED PARTICLE TREATMENT SYSTEM」was granted the utility model patent and patented as TW543872, CN 206915819U.
    • 「WASTE LIQUID TREATMENT APPARATUS」was granted the utility model patent and patented as TW569753.
    • 「RECYCLING APPARATUS FOR COPPER-CONTAINING WASTEWATER」was granted the utility model patent and patented as TW569755.
    • 「AMMONIUM-CONTAINING WASTEWATER TREATMENT APPARATUS」was granted the utility model patent and patented as TW569756.
    • 「APPARATUS FOR TREATING FLUORIDE-CONTAINING WASTEWATER」was granted the utility model patent and patented as TW570311.
    • 「APPARATUS FOR HYDROGEN PEROXIDE DEGRADATION IN CARO’S ACID」was granted the utility model patent and patented as TW570526.
    • 「ORGANIC SLUDGE DEWATERING APPARATUS」was granted the utility model patent and patented as TW572369.
    • 「ORGANIC SLUDGE CONDITIONING CHEMICALS AND THE SLUDGE DEWATERING APPROACH APPLYING THE ORGANIC SLUDGE CONDITIONING CHEMICALS」was granted the utility model patent and patented as TW666174.
    • 「NITRIC ACID WASTEWATER TREATMENT APPARATUS」was granted the utility model patent and patented as TW585172.
    • 「TREATMENT APPARATUS FOR ORGANIC WASTEWATER CONTAINING ISOPROPYL ALCOHOL」was granted the utility model patent and patented as TW585263.
    • 「EXHAUST GAS TREATMENT APPARTUS」was granted the utility model patent and patented as TW588019.
    • 「HYBRID TREATMENT APPARATUS FOR TREATING ORGANIC WASTEWATER」was granted the utility model patent and patented as TW 706919.
    • 「WAFER CUTTING PROTECTION LIQUID」was granted the utility model patent and patented as TW 707907.
    • 「WASTEWATER RETRIEVE SYSTEM」was granted the utility model patent and patented as TW604782, TW608084.
    • 「HIGHLY-EFFICIENT WASTEWATER TREATMENT SYSTEM」 was granted the utility model patent and patented as TW610916.
    • 「WASTEWATER RECIRCULATION TREATMENT SYSTEM」was granted the utility model patent and patented as TW 610940.
    • 「LASER SAWING SOLUTION」 was granted the invention patent and patented as TW 729374.
    • 「BIOLOGICAL WASTEWATER TREATMENT SYSTEM」 was granted the utility model patent and patented as TW 616350.
    • 「AMMONIA NITROGEN WASTEWATER TREATMENT SYSTEM」 was granted the utility model patent and patented as TW 623704.
    • 「ORGANIC WASTEWATER TREATMENT AND RECYCLE SYSTEM」 was granted the utility model patent and patented as TW 623715.
    • 「SULFIDE-RICH ORGANIC WASTEWATER TREATMENT SYSTEM」 was granted the utility model patent and patented as TW 623779.
    • 「NITRATE WASTEWATER TREATMENT SYSTEM」 was granted the utility model patent and patented as TW623807.
    • 「ISOPROPYL ALCOHOL WASTEWATER TREATMENT SYSTEM」was granted the utility model patent and patented as TW 624493.
  11. Research and development (R&D) projects and estimated R&D expenditures
    The Topco Scientific Group will continue our past R&D momentum and devote resources to the R&D of new product and technology. Especially given that explosive growth is expected in the future AI, 5G, electric car and autopilot driving markets, the demand for advancement in the semiconductor and photoelectric process technology will certainly increase as well as the demand for semiconductor and photelectric products. The Group will develop the corresponding application materials to meet customer demands; and on the other hand, will maintain our commitment to promoting energy thus further invest in the R&D of green technology and technology related the circular economy. Total budget for R&D expenditure for 2022 was NT$ 104,052 thousand, representing an increase of 2.8% against 2021.