ArF Photoresist
ArF Photoresist is a key material in lithography process. Pattern on photomask can be transferred to substate by its photosensitive property.
Production Intro
Use：
- Lithography process.
Spec
- Unit : Gallon
- The material is stored in a brown glass bottle, and another manufacturer uses NOWpak packaging.
- Keep refrigerated
- Bonded goods
Product Contact
Terry Wang
- TOPCO SCIENTIFIC CO.,LTD.
- Director
- Sales Dept. I, Advanced Material Div. II, 1st Business Unit
7F.,No.176,Zhouzi St.,Neihu Dist., Taipei City 114064, Taiwan 114064
TEL: (02)8797-8020 ext.2824
