KrF Photoresist
DUV KrF photoresist is a key material in lithography process. Pattern on photomask can be transferred to substrate by its photosensitive property.
Production Intro
Use：
- Lithography process
Spec
- Unit : Gallon
- The material is stored in a brown glass bottle, and another manufacturer uses NOWpak packaging.
- Keep refrigerated
- Bonded goods
Product Contact
Li Wei Chen
- TOPCO SCIENTIFIC CO.,LTD.
- Director
- Sales Dept. Ⅱ, Advanced Material Div. II, 1st Business Unit
7F.,No.176,Zhouzi St.,Neihu Dist., Taipei City 114064, Taiwan 114064
TEL: (02)8797-8020 ext.2830
