Nanoimprint Equipment

Nanoimprint lithography (NIL) is a method of fabricating micro-structure form about 10nm to 10um. It has a simple process with low cost, high throughput and high resolution, which made it many applications in optics, biotech and semiconductors.

There is now a growing need from corporate R&D departments, universities and research institutes to purchase nanoimprinting equipment for the purpose of basic research and experiments using a variety of materials.

SCIVAX developed a revolutionary concept to handle a wide range of processes and now supporting customers with know-how cultivated through over 1,000 contracts. From manual tool RubiQ® which suited for R&D and small-scale production, to fully automated tool Dyad® which suited for mass production, SCIVAX delivers nanoimprint tools responding to a variety of requests.

Features:

SCIVAX’s NIL can reduce distortion to 1/100 of that of other companies,

which meets the requirements of AR/VR applications (AR waveguide).

Using SCIVAX’s FLAN method, which minimizes stress on the molded substrate, we can imprint on delicate substrates like compound semiconductor wafers.

By combining different units, SCIVAX can deliver nanoimprint equipment customized to suit our customers’ needs. (UV or Thermal, Rigid or air press, etc.)

RubiQ® Compact size: W500×D700×H1700(mm), UV specifications: 200mm W/cm2~@365nm Maximum work size: φ100mm(to be expended to φ200mm in near future) SCIVAX also provides a variety of optional features to meet customer requirements in nanoimprint: Cure method: UV / Thermal / Both Press Method: Parallel Plate / FLAN*Air assisted(Scivax patented) / Both  Automatic processing / Mold lift pin-up function / HEPA filter unit, Ionizer blower / High intensity UV LED unit / Pirani vacuum gauge (50Pa-)

Dyad® 200 Fully automated NIL Equipment, by TAZMO and SCIVAX. Function: Coating, Backing, Cooling, Replication, FOUP to FOUP